| 43406 |
Creator |
c3baa1aae2495d9fcf383c433b46bfe0 |
| 43406 |
Creator |
ext-86af4b6bb4c489ee79339896ac797f55 |
| 43406 |
Creator |
ext-98c091e2b526de5bd4a1fc704b1f977f |
| 43406 |
Date |
2011-09-19 |
| 43406 |
Is Part Of |
repository |
| 43406 |
abstract |
Poly-(dimethyl siloxane) (PDMS) is a versatile material frequently used in the fabrication
of micro and nano scale devices. It has a unique combination of properties including
excellent thermal and chemical stability and non-toxicity making it an attractive
material for use in many fields of science, especially in biomedical research. Its
sensitivity to electron radiation has led to its use as a resist for subsequent substrate
patterning albeit generally in a modified form. Here we analyze the effects of exposing
liquid PDMS to electron radiation over a large range of doses on the resulting elastic
modulus and topography. The data shows that PDMS processed using e-beam lithographic
techniques is a viable structural material capable of being utilized in the next generation
of microfluidic and other micro devices. |
| 43406 |
authorList |
authors |
| 43406 |
presentedAt |
ext-7011d0e678a0efd9589f7ef213f29bf8 |
| 43406 |
status |
nonPeerReviewed |
| 43406 |
uri |
http://data.open.ac.uk/oro/document/319471 |
| 43406 |
uri |
http://data.open.ac.uk/oro/document/319496 |
| 43406 |
uri |
http://data.open.ac.uk/oro/document/319497 |
| 43406 |
uri |
http://data.open.ac.uk/oro/document/319498 |
| 43406 |
uri |
http://data.open.ac.uk/oro/document/319499 |
| 43406 |
uri |
http://data.open.ac.uk/oro/document/319500 |
| 43406 |
uri |
http://data.open.ac.uk/oro/document/321749 |
| 43406 |
type |
AcademicArticle |
| 43406 |
type |
Article |
| 43406 |
label |
Bowen, J. ; Cheneler, D. and Robinson, A. P. G. (2011). Direct e-beam lithography
of PDMS. In: 37th International Conference on Micro and Nano Engineering, 19-22
Sep 2011, Berlin, Germany. |
| 43406 |
label |
Bowen, J. ; Cheneler, D. and Robinson, A. P. G. (2011). Direct e-beam lithography
of PDMS. In: 37th International Conference on Micro and Nano Engineering, 19-22
Sep 2011, Berlin, Germany. |
| 43406 |
Title |
Direct e-beam lithography of PDMS |
| 43406 |
in dataset |
oro |