| 43174 |
Creator |
c3baa1aae2495d9fcf383c433b46bfe0 |
| 43174 |
Creator |
ext-73ef49379941fd35ad6ecc834631b8e0 |
| 43174 |
Creator |
ext-435d18d01d0b2dcc976c435c3cfb8c96 |
| 43174 |
Date |
2012-09 |
| 43174 |
Is Part Of |
repository |
| 43174 |
Is Part Of |
p18735568 |
| 43174 |
abstract |
In this paper, the viability of directly exposing thin films of liquid poly(dimethylsiloxane)
(PDMS) to electron beam (e-beam) irradiation using e-beam lithographic methods for
the purpose of creating permanent micro-scale components has been investigated. By
exposing 1.1 μm thickness PDMS films to doses in the range 10-50,000 μC/cm<sup>2</sup>,
it was discovered that the structure of the resultant film exhibits four distinct
phases, depending upon the exposure dose. These phases were manifest in both the resultant
Young's modulus and thickness of the developed film. It was found that there is a
critical dose whereupon the resultant film undergoes solidification and adheres to
the countersurface sufficiently to survive the development process. It has been shown
that the Young's modulus of the solid film can be varied over seven orders of magnitude,
from that of a viscoelastic material through a rubbery regime to that of a glassy
one, by increasing the e-beam dose. At higher doses, excessive backscattering was
observed, as well as film swelling, resulting in poor spatial resolution. |
| 43174 |
authorList |
authors |
| 43174 |
status |
peerReviewed |
| 43174 |
uri |
http://data.open.ac.uk/oro/document/335209 |
| 43174 |
uri |
http://data.open.ac.uk/oro/document/335210 |
| 43174 |
uri |
http://data.open.ac.uk/oro/document/335211 |
| 43174 |
uri |
http://data.open.ac.uk/oro/document/335212 |
| 43174 |
uri |
http://data.open.ac.uk/oro/document/335213 |
| 43174 |
uri |
http://data.open.ac.uk/oro/document/335214 |
| 43174 |
uri |
http://data.open.ac.uk/oro/document/335346 |
| 43174 |
volume |
97 |
| 43174 |
type |
AcademicArticle |
| 43174 |
type |
Article |
| 43174 |
label |
Bowen, J. ; Cheneler, D. and Robinson, A. P. G. (2012). Direct e-beam lithography
of PDMS. Microelectronic Engineering, 97 pp. 34–37. |
| 43174 |
label |
Bowen, J. ; Cheneler, D. and Robinson, A. P. G. (2012). Direct e-beam lithography
of PDMS. Microelectronic Engineering, 97 pp. 34–37. |
| 43174 |
Title |
Direct e-beam lithography of PDMS |
| 43174 |
in dataset |
oro |